Nano colloidalal jet is a new process method for polishing and processing semiconductor materials, in which the dispersion stability of the jet polishing slurry has a greater impact on the polishing effect. In this paper, CeO2 with a diameter of 10nm is used as the abrasive, and the volume fraction of ethanol, the mass fraction of PVP, and the PH of the polishing slurry are selected as the test factors. The image gray value method was used to characterize the dispersion stability of the polishing slurry, and the influence of the composition parameters of the polishing slurry on its dispersion stability was analyzed. This paper mainly uses the Box-Behnken response surface method to optimize the dispersion and stability conditions of the nano-CeO2 colloidalal polishing slurry. The research results show that the optimal dispersion conditions of the nano-CeO2 colloidalal polishing slurry are 61% ethanol volume fraction, 3% PVP mass fraction, and PH value of the polishing slurry 10. Under this optimal condition, the gray value of the prepared nano colloidalal jet polishing slurry is 183, which is very consistent with the predicted value of the response surface model, and the dispersion performance of the polishing slurry is good and the suspension is stable.
 

Semiconductor polishing; Nanoparticle colloidal jet polishing slurry; dispersion stability; gray value; response surface methodology